Electron-Beam Fabricated Optical Components and their Applications for Remote Sensing, Astronomy, Metrology, and Biology

Dan Wilson, Principal Engineer, Instrument Electronics and Sensors Section, Jet Propulsion Laboratory

Since the early 1990s, researchers in JPL's Microdevices Laboratory have been developing electron-beam lithography techniques for fabricating unique optical components. By combining careful calibration techniques with the precision of the electron-beam tool, three-dimensional surfaces can be created with accuracies down to tens of nanometers. This allows us to fabricate high-performance diffractive optics such as shaped-groove gratings and computer-generated holograms that are designed using optical wavefront engineering algorithms. A number of these components have matured to meet space flight hardware requirements, such as the convex gratings used in the Compact Reconnaissance Imaging Spectrometer for Mars (flying aboard Mars Reconnaissance Orbiter) and Moon Mineralogy Mapper (flying aboard Chandrayaan-1). This talk will provide an overview of our fabrication techniques and design methods, as well as examples of components that are used for a variety of applications.

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